| 摘要: |
| 通过对预烘、光刻胶旋涂、软烘焙、对准曝光、后烘、显影、坚膜的光刻工艺过程分析,主要介绍了光刻工艺中容易出现的问题及解决方法,并通过实验和分析得出了可靠的技术方案. |
| 关键词: 光刻 光刻工艺 光刻胶 |
| DOI： |
| 分类号: |
| 基金项目:973计划预研专项(2012CB326402);上海市科委创新项目(13ZZ108) |
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| Research on photolithography graphic pattern transfer technology |
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ZHANG Yongping, CHENG Yue, LU Wuyue, TAN Jiahui, ZHAO Gaojie, LIU Yihong, SUN Yujun, CHEN Zhizhan, SHI Wangzhou, LI Wanrong, LU Yifeng
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College of Mathemcties and Sciences,Shanghai Normal University
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| Abstract: |
| The process of the photolithography were introduced in this paper,including pre-baking,the photoresist coating,soft baking,alignment and exposure,post-exposure baking,development,hard baking.Then we mainly discussed the problems in the photolithography process and the solutions of these problems. We did large number of experiments,and the results were carefully analyzed. Finally,reliable and stable solutions were provided via analyzis and experiments. |
| Key words: photolithography photolithography technique photoresist |
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